MgO (Magnesium Oxide)

  Magnesium Oxide substrate is widely used for various films: magnet film, semiconductive film, optical film as well as high Tc superconductive film. MgO crystal is possible to get large size (larger than 2 inch) and has low dielectric loss in microwave band, so it is an important material for high Tc superconductive microwave devices in the mobile communication as well as other industrial areas.  

MgO Substrates

Crystalline Attributes:

Crystal structure

cubic  m3m  NaCl type
Cell parameter a=4.213 Å
Melting point 3250°K
Density 3.58g/cm3
Specific Heat 0.879J/g·k(298°K)
Thermal conductivity 59W/m·k(300°K)
Thermal expansion 11x10-6k-1(300°K)
Dielectric constant (εr)

9.8(295°K)    9.7(80°K)    (17-28GHz)

Dielectric loss (tgδ)

3.5x10-6(80°K)    microwave
Hardness (Mohs) 5.5
Growth Method Arc Melt

Substrate Specifications:

Standard Size: 2”x2”，Ф2″，1”x1”, 20x20，10x10，10x5，10x3mm…or customer design

Thickness:   0.5mm，1.0mm

Thickness tolerance:  ±0.02mm or ±0.005mm for special order

Polish:  one or two sides

Orientation：＜100＞  ＜110＞  ＜111＞

Orientation accuracy: ±0.5°

Edge Orientation accuracy:   2°（or 1°for special order）

Cut with special tilt angle ： available (tilt angle:1°－45°）

Micro roughness Ra：≤5Å（5μm×5μm）

　

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